A holder to be used for lithography process
Status:
New
Accepting:
Fabrication bids
Type / Tier:
technical / silver
Material:
metal
ceramic or high temp plastic
Design price:
Payment pending
Fabrication price:
Pending
Order #:
20160610191636-481-01-0
Additional Information
A wafer-shaped holder with diameter of 100mm and thickness less than 1mm. On the surface there should be array of cuboid wells 4.25mm*3.76mm with a depth of 0.254mm. The tolerance for the wells should be less than 20um. For material selection, it should stand 200-300 degree C of temperature, and chemically stable in photoresist (Shipley series and SU8) and various solutions such as IPA, acetone, TMAH and NMP. Some machines it might go through include ebeam deposition, sputtering and hot plate.
Design Activity
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Weldon Hall's proposal
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